Atomic Layer Deposition Equipment Market Report by Product (Metal ALD, Aluminum Oxide ALD, Plasma Enhanced ALD, Catalytic ALD, and Others), Application (Semiconductors, Solar Devices, Electronics, Medical Equipment, and Others), and Region 2024-2032

Atomic Layer Deposition Equipment Market Report by Product (Metal ALD, Aluminum Oxide ALD, Plasma Enhanced ALD, Catalytic ALD, and Others), Application (Semiconductors, Solar Devices, Electronics, Medical Equipment, and Others), and Region 2024-2032

Report Format: PDF+Excel | Report ID: SR112024A5972
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Market Overview:

The global atomic layer deposition equipment market size reached US$ 6.6 Billion in 2023. Looking forward, IMARC Group expects the market to reach US$ 22.6 Billion by 2032, exhibiting a growth rate (CAGR) of 14.5% during 2024-2032.

Report Attribute
 Key Statistics 
Base Year
2023
Forecast Years
2024-2032
Historical Years
2018-2023
Market Size in 2023
US$ 6.6 Billion
Market Forecast in 2032
US$ 22.6 Billion
Market Growth Rate 2024-2032 14.5%


Atomic layer deposition (ALD) refers to a vapor phase technique that is deployed for depositing ultra-thin films on top of a substrate after getting exposed to alternating precursors. Some of the commonly used equipment includes single wafer, batch, plasma, large substrate ALD reactors, thin-film electroluminescent (TFEL) displays and other electronic components. These tools help in ensuring uniformity by controlling the thickness and improving or modifying various properties of substrates, including resistance, conductivity, and strength. On account of these properties, it is used in semiconductors, electronics, optical devices, fuel cells and thermoelectric materials. At present, atomic layer deposition equipment is commercially available in varying types, such as metal, plasma-enhanced, aluminum oxide, and catalytic.

Atomic Layer Deposition Equipment Market

Atomic Layer Deposition Equipment Market Trends:

The widespread adoption of ALD equipment across various research and development (R&D) facilities, healthcare, and solar sector on account of the increasing need for flexible tools to improve functionality and offer higher accuracy is primarily driving the market growth. In line with this, the rising demand for miniaturization, semiconductors, and power management systems in electronic materials for depositing various products, including data storage, small electronic components and display devices are further contributing to the market growth. This is further supported by the utilization of atomic layer deposition equipment for manufacturing integrated circuits (IC), chips, and micro-electromechanical systems (MEMS) products, such as optical switches, sensors, and computers. In line with this, significant technological advancements have led to the introduction of spatial ALD for flexible electronics and three-dimensional (3D) printed reactors to ensure uniformity and conformity of complex 3D nanostructures, which is acting as another growth-inducing factor. Additionally, the escalating requirement for solid-state thin-film batteries due to the increasing uptake of implantable, smartwatches, smartphones and medical equipment is contributing to the market growth. Apart from this, strategic collaborations amongst key players for launching plasma-enhanced ALD are creating a positive outlook for the market.

Key Market Segmentation:

IMARC Group provides an analysis of the key trends in each sub-segment of the global atomic layer deposition equipment market report, along with forecasts at the global, regional and country level from 2024-2032. Our report has categorized the market based on product and application.

Breakup by Product:

  • Metal ALD
  • Aluminum Oxide ALD
  • Plasma Enhanced ALD
  • Catalytic ALD
  • Others
     

Breakup by Application:

  • Semiconductors
  • Solar Devices
  • Electronics
  • Medical Equipment
  • Others
     

Breakup by Region:

  • North America
    • United States
    • Canada
  • Asia-Pacific
    • China
    • Japan
    • India
    • South Korea
    • Australia
    • Indonesia
    • Others
  • Europe
    • Germany
    • France
    • United Kingdom
    • Italy
    • Spain
    • Russia
    • Others
  • Latin America
    • Brazil
    • Mexico
    • Others
  • Middle East and Africa
     

Competitive Landscape:

The competitive landscape of the industry has also been examined along with the profiles of the key players being Arradiance LLC, ASM International, Beneq Oy, CVD Equipment Corporation, Forge Nano Inc., Kurt J. Lesker Company, Lam Research Corporation, Oxford Instruments plc, Picosun Oy (Applied Materials Inc.), SENTECH Instruments GmbH, Veeco Instruments Inc., Wonik IPS Co. Ltd. and Tokyo Electron Limited.

Report Coverage:

Report Features Details
Base Year of the Analysis 2023
Historical Period 2018-2023
Forecast Period 2024-2032
Units US$ Billion
Segment Coverage Product, Application, Region
Region Covered  Asia Pacific, Europe, North America, Latin America, Middle East and Africa
Countries Covered United States, Canada, Germany, France, United Kingdom, Italy, Spain, Russia, China, Japan, India, South Korea, Australia, Indonesia, Brazil, Mexico
Companies Covered Arradiance LLC, ASM International, Beneq Oy, CVD Equipment Corporation, Forge Nano Inc., Kurt J. Lesker Company, Lam Research Corporation, Oxford Instruments plc, Picosun Oy (Applied Materials Inc.), SENTECH Instruments GmbH, Veeco Instruments Inc., Wonik IPS Co. Ltd. and Tokyo Electron Limited
Customization Scope 10% Free Customization
Report Price and Purchase Option Single User License: US$ 3899
Five User License: US$ 4899
Corporate License: US$ 5899
Post-Sale Analyst Support 10-12 Weeks
Delivery Format PDF and Excel through Email (We can also provide the editable version of the report in PPT/Word format on special request)

Key Questions Answered in This Report

The global atomic layer deposition equipment market was valued at US$  6.6 Billion in 2023.

We expect the global atomic layer deposition equipment market to exhibit a CAGR of 14.5% during 2024-2032

The sudden outbreak of the COVID-19 pandemic had led to the implementation of stringent lockdown regulations across several nations, resulting in the temporary closure of numerous manufacturing units for atomic layer deposition equipment.  

The rising demand for atomic layer deposition equipment for manufacturing Integrated Circuits (ICs), chips, and Micro-Electromechanical Systems (MEMS) products, such as optical switches, sensors, and computers, is primarily driving the global atomic layer deposition equipment market.

Based on the product, the global atomic layer deposition equipment market has been segregated into metal ALD, aluminum oxide ALD, plasma enhanced ALD, catalytic ALD, and others. Among these, aluminum oxide ALD currently holds the largest market share.

Based on the application, the global atomic layer deposition equipment market can be bifurcated into semiconductors, solar devices, electronics, medical equipment, and others. Currently, semiconductors exhibit a clear dominance in the market.

On a regional level, the market has been classified into North America, Asia-Pacific, Europe, Latin America, and Middle East and Africa, where Asia-Pacific currently dominates the global market.

Some of the major players in the global atomic layer deposition equipment market include Arradiance LLC, ASM International, Beneq Oy, CVD Equipment Corporation, Forge Nano Inc., Kurt J. Lesker Company, Lam Research Corporation, Oxford Instruments plc, Picosun Oy (Applied Materials Inc.), SENTECH Instruments GmbH, Veeco Instruments Inc., Wonik IPS Co. Ltd., and Tokyo Electron Limited.

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Atomic Layer Deposition Equipment Market Report by Product (Metal ALD, Aluminum Oxide ALD, Plasma Enhanced ALD, Catalytic ALD, and Others), Application (Semiconductors, Solar Devices, Electronics, Medical Equipment, and Others), and Region 2024-2032
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