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The United States photoresist and photoresist ancillaries market is currently witnessing strong growth. A photoresist is a photosensitive material that can change its chemical structure when exposed to ultraviolet light. Photoresist ancillaries are supporting products that are used to improve the efficiency and resolution of the photolithography or photoengraving process. Resins with the desired solvent and a Photo Active Generator (PAG) compound are the basic raw materials used to manufacture photoresist chemicals and ancillaries. Positive photoresists are soluble, while negative photoresists become insoluble and cross-linked when exposed to UV light. They are used in flat panel displays and wiring configurations for the manufacturing of multi-layer semiconductors.
The United States photoresist and photoresist ancillaries market is primarily driven by the flourishing semiconductor industry. The trend of miniaturization in the semiconductor industry has enabled the development of advanced technologies that now form the backbone of the modern electronics industry. This has been supported by the development of polymer-based photoresist materials and consequent advances in the photolithography process. These advances have led to the evolution of microfabrication technology resulting in higher-level integration and downscaling of semiconductor ICs. Besides this, the growing demand for advanced gadgets, such as computers, laptops, phones, and other household appliances, has led to increased use of raw materials such as photoresist and photoresist ancillaries. Moreover, the increasing research and development (R&D) activities, technological advancements in the display technology and the expanding semiconductor industry are some of the other factors contributing to the market. Due to these factors, the market is expected to continue its strong growth during the forecast period (2021-2026).
IMARC Group provides an analysis of the key trends in each sub-segment of the United States photoresist and photoresist ancillaries market report, along with forecasts for growth at the region level from 2021-2026. Our report has categorized the market based on region, photoresist type, photoresist ancillaries type and application.
Breakup by Photoresist Type:
Breakup by Photoresist Ancillaries Type:
Breakup by Application:
Breakup by Region:
The competitive landscape of the industry has also been examined along with the profiles of the key players.
The United States photoresist and photoresist ancillaries market was valued at US$ 845.9 Million in
We expect the United States photoresist and photoresist ancillaries market to exhibit a CAGR of 5.60%
The rising adoption of photoresist and photoresist ancillaries in manufacturing several consumer
devices, such as laptops, smartphones, and multimedia players, is currently driving the United States
photoresist and photoresist ancillaries market.
The sudden outbreak of the COVID-19 pandemic had led to the implementation of stringent lockdown
regulations across the nation resulting in temporary closure of numerous end use industries for
photoresist and photoresist ancillaries.
Based on the photoresist type, the United States photoresist and photoresist ancillaries market can be
segmented into ArF immersion, KrF, ArF dry, and g- and i-line. Currently, ArF immersion holds the
majority of the total market share.
Based on the photoresist ancillaries type, the United States photoresist and photoresist ancillaries
market has been divided into anti-reflective coatings, remover, developer, and others. Among these,
anti-reflective coatings exhibit a clear dominance in the market.
Based on the application, the United States photoresist and photoresist ancillaries market can be
categorized into semiconductors & ICs, LCDs, printed circuit boards, and others. Currently,
semiconductors & ICs account for the largest market share.
On a regional level, the market has been classified into Northeast, Midwest, South, and West, where
South currently dominates the United States market.
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